{"id":10716,"date":"2023-10-10T11:33:36","date_gmt":"2023-10-10T02:33:36","guid":{"rendered":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/?p=10716"},"modified":"2023-10-10T11:33:36","modified_gmt":"2023-10-10T02:33:36","slug":"post-10716","status":"publish","type":"post","link":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/2023\/10\/10\/post-10716\/","title":{"rendered":"\u7b2c654\u56de\u30ec\u30fc\u30b6\u30fc\u79d1\u5b66\u7814\u7a76\u6240\u30b3\u30ed\u30ad\u30a6\u30e0"},"content":{"rendered":"

\u25cf\u65e5\u6642(Date):
\n2023.10.25 11:00-<\/p>\n

\u25cb\u5834\u6240(Place):
\n\u30ec\u30fc\u30b6\u30fc\u79d1\u5b66\u7814\u7a76\u6240 \u7814\u7a76\u68df3F \u5927\u4f1a\u8b70\u5ba4<\/p>\n

\u30cf\u30a4\u30d6\u30ea\u30c3\u30c9\u958b\u50ac\u3067\u3059\u306e\u3067\u3001Zoom\u304b\u3089\u3067\u3082\u3054\u53c2\u52a0\u3044\u305f\u3060\u3051\u307e\u3059\u3002
\n\u30aa\u30f3\u30e9\u30a4\u30f3\u3067\u306e\u63a5\u7d9a\u5148\uff1a
\nhttps:\/\/us02web.zoom.us\/j\/84649212475<\/a>
\n\u30df\u30fc\u30c6\u30a3\u30f3\u30b0 ID: 846 4921 2475<\/p>\n

\u25cf\u8b1b\u6f14\u8005(Speaker):
\nZdenek Hubicka (Institute of Physics, Czech Academy of Sciences)<\/p>\n

\u25cb\u984c\u76ee(Title):
\nReactive pulsed sputtering of semiconducting ternary oxide thin films
\nfor photoelectrochemical applications<\/p>\n

\u25cf\u6982\u8981(Abstract):
\nReactive pulsed magnetron sputtering is recently intensively studied
\nas a tool for oxide semiconducting thin films depositions. One benefit
\nof this technology is good compatibility with industrial
\nprocesses. Great progress was done in different forms of reactive high
\npower impulse magnetron sputtering systems (r-HiPIMS) \u00a0which were
\nalready used for various types of oxide semiconducting thin films
\ndepositions. This r-HiPIMS technique can provide high fraction of
\nsputtered particles to be ionized and relatively high ion fluxes with
\nspecific energetic ion distribution function are detected in \u00a0the
\nposition of substrate. These parameters of r-HiPIMS plasma can
\nsignificantly influence semiconducting properties of deposited
\nfilms. The last options of HiPIMS technology includes positive pulse
\nallowing to boost and control of ion bombardment and ion fluxes on
\ngrowing films. Other options contain \u00a0possibility to control \u00a0current
\nand voltage waveforms in order to further influence plasma parameters
\nduring the deposition process. \u00a0We have used various forms of r-HiPIMS
\ntechniques for the deposition \u00a0of ternary oxide semiconducting thin
\nfilms \u00a0which can work as thin film photoanodes or photocathodes in
\nphotoelectrochemical cells which are suitable for solar water
\nsplitting and hydrogen production. These ternary oxides were usually
\ndeposited by r-HiPIMS co-sputtering from two metallic targets in Ar+O2
\ngas mixture. The first material which we have intensively studied were
\nCuFeO2 thin films with delafossite structure and p-type
\nconductivity. It was confirmed that r-HiPIMS technique can be used for
\nthe deposition of CuFeO2 films with polycrystalline structure
\ncontaining delafossite phase under specific conditions in HiPIMS
\nplasma. These films were working as photocathodes in PEC cells and
\nphotocurrents in cathodic regions were studied in specific
\nelectrolytes. Electrochemical stability was assessed as well. \u00a0Ternary
\noxide films containing CuWO4 phase were \u00a0deposited as n-type
\nsemiconductor by r-HiPIMS co-sputtering in Ar+O2 gas mixture. Cu and W
\nmetallic magnetron targets were used for this purpose. \u00a0These films
\nwere found functional as photoanodes for PEC cells and quite
\npronounced photocurrents in anodic region were detected during
\nphotoelectrochemical measurements. The electrochemical stability was
\nmeasured as well. \u00a0In order to optimize deposition conditions for
\nthese experiments, plasma parameters in r-HiPIMS systems were
\ninvestigated by ion mass spectrometry, time resolved emission
\nspectroscopy and time resolved Langmuir probe system. \u00a0Furthermore a
\nnew version of RF probe was developed which was able to measure ion
\nflux density, electron temperature and ion density with time
\nresolution. This new probe was very robust also in highly reactive
\nplasma and was able to work also in case the probe surface was coated
\nwith electrically insulating layer. In this way, we were able to
\nmonitor these plasma parameters also during all the time of deposition
\nprocess.<\/p>\n

\u25cb\u9023\u7d61\u5148(Contact Person):
\n\u5c71\u30ce\u4e95\u822a\u5e73<\/p>\n","protected":false},"excerpt":{"rendered":"

\u25cf\u65e5\u6642(Date): 2023.10.25 11:00- \u25cb\u5834\u6240(Place): \u30ec\u30fc\u30b6\u30fc\u79d1\u5b66\u7814\u7a76\u6240 \u7814\u7a76\u68df3F \u5927\u4f1a\u8b70\u5ba4 \u30cf\u30a4\u30d6\u30ea\u30c3\u30c9\u958b\u50ac\u3067\u3059\u306e\u3067\u3001Zoom\u304b\u3089\u3067\u3082\u3054\u53c2\u52a0\u3044\u305f\u3060\u3051\u307e\u3059\u3002 \u30aa\u30f3\u30e9\u30a4\u30f3\u3067\u306e\u63a5\u7d9a\u5148\uff1a http […]<\/p>\n","protected":false},"author":3,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_links_to":"","_links_to_target":""},"categories":[6,7,8],"tags":[],"_links":{"self":[{"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/posts\/10716"}],"collection":[{"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/users\/3"}],"replies":[{"embeddable":true,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/comments?post=10716"}],"version-history":[{"count":1,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/posts\/10716\/revisions"}],"predecessor-version":[{"id":10717,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/posts\/10716\/revisions\/10717"}],"wp:attachment":[{"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/media?parent=10716"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/categories?post=10716"},{"taxonomy":"post_tag","embeddable":true,"href":"http:\/\/www-wp22.ile.osaka-u.ac.jp\/wp-json\/wp\/v2\/tags?post=10716"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}