Professor Shinsuke Fujioka of the Institute of Laser Engineering (ILE), The University of Osaka, has been elected a 2026 Fellow of the American Physical Society (APS).<\/p>\n
APS Fellowship recognizes researchers who have made exceptional contributions to the advancement of physics. The APS is one of the largest physics societies in the world, with more than 50,000 members. Each year, no more than 0.5% of its membership is elected to Fellowship through nomination and review by fellow members. Professor Fujioka was elected upon the recommendation of the Division of Plasma Physics.<\/p>\n
Citation
\n“For pioneering work on the efficient creation of high-energy-density plasmas using a combination of high-intensity short-pulse lasers and magnetic fields, and for significant contributions to extreme UV lithography.”<\/p>\n
To date, nine ILE faculty members have been elected APS Fellows: Prof. Kunioki Mima (1988), Prof. Katsunobu Nishihara (1990), Prof. Sadao Nakai (1993), Prof. Yoshiaki Kato (1995), Prof. Hideaki Takabe (2000), Prof. Kazuo A. Tanaka (2003), Prof. Ryosuke Kodama (2008), Prof. Yasuhiko Sentoku (2018), and Prof. Shinsuke Fujioka (2026).<\/p>\n
Research Highlights<\/p>\n
Professor Fujioka developed a method for generating kilotesla-class magnetic fields by driving a capacitor-coil target with a high-power laser [1]. Using these strong fields to guide fast electrons produced by a high-intensity short-pulse laser, he demonstrated “magnetized fast isochoric heating,” which heats fuel efficiently, using ILE’s GEKKO XII and LFEX lasers [2]. With this approach, his team achieved ultra-high-energy-density states [2] and petapascal-class pressures (about 10 billion atmospheres) [3]. These results pave the way toward more efficient laser fusion. He has also reproduced X-ray astronomical phenomena in the laboratory, using a miniature compact-object analog created by laser-driven implosion [4].<\/p>\n
In EUV lithography, he clarified the mechanism of extreme-ultraviolet emission from laser-produced tin plasmas [5]. He also proposed and demonstrated a scheme in which tin microdroplets are irradiated with double laser pulses, enabling an efficient light source with minimal debris [6]. This scheme underlies the basic configuration of the EUV light sources now used in high-volume semiconductor manufacturing.<\/p>\n
References<\/p>\n
S. Fujioka et al., “Kilotesla magnetic field due to a capacitor-coil target driven by high power laser,” Sci. Rep. 3, 1170 (2013).
\nS. Sakata et al., “Magnetized fast isochoric heating for efficient creation of ultra-high-energy-density states,” Nat. Commun. 9, 3937 (2018).
\nK. Matsuo et al., “Petapascal pressure driven by fast isochoric heating with multi-picosecond intense laser pulse,” Phys. Rev. Lett. 124, 035001 (2020).
\nS. Fujioka et al., “X-ray astronomy in the laboratory with a miniature compact object produced by laser-driven implosion,” Nature Phys. 5, 821\u2013825 (2009).
\nS. Fujioka et al., “Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas,” Phys. Rev. Lett. 95, 235004 (2005).
\nS. Fujioka et al., “Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production,” Appl. Phys. Lett. 92, 241502 (2008).<\/p>\n